Method for manufacturing a mask with an aspect ratio>1

Details Method for manufacturing a mask with an aspect ratio>1 Method for manufacturing a mask with an aspect ratio>1

B - Operations, Transporting

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B05D 3/06 (2006.01) G03C 5/00 (2006.01) G03F 1/14 (2006.01) G03F 7/20 (2006.01) H05K 3/00 (2006.01) H05K 3/10 (2006.01)

Patent

CA 1079566

FABRICATION OF HIGH ASPECT RATIO MASKS Abstract of the Disclosure A method of constructing masks characterized by a high aspect ratio. The method includes at least a single exposure of a mask by radiation which is transmitted by the substrate before impinging on the resist. In a specific embodiment the mask is partially completed and the already deposited mask modulates the radiation transmitted by the substrate before it exposes the resist.

254965

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