Method for manufacturing a nonlinear optical thin film

Details Method for manufacturing a nonlinear optical thin film Method for manufacturing a nonlinear optical thin film

C - Chemistry, Metallurgy

23

C

C23C 14/10 (2006.01) G02F 1/355 (2006.01)

Patent

CA 2281265

A method for manufacturing a nonlinear optical thin film of a silica glass system with sufficient nonlinear optical characteristics, in which a glass substrate 12 is disposed within a vacuum deposition chamber 10 and an electron beam is applied to a SiO2-GeO2-system glass placed on a hearth liner 14 to form a SiO2-GeO2-system thin film on the surface of the substrate 12. In an application of this method, ions of argon, for example, are emitted from an ion source to produce dipoles in the deposited SiO2-GeO2-system thin film. By applying an electric field to the SiO2-GeO2-system thin film thus formed, the dipoles are oriented to let the thin film exhibit nonlinear optical characteristics.

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