Method for manufacturing a waveguide component with several...

G - Physics – 02 – B

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G02B 6/122 (2006.01) G02B 6/13 (2006.01) G02B 6/132 (2006.01)

Patent

CA 2434660

The invention relates to a method for manufacturing a waveguide component with several layers stacked on a silicon substrate. Said component comprises a buffer layer (2) which is positioned on said substrate (1), a guiding layer (3) which is positioned on the buffer layer and which is used to produce a waveguide device (6), and an outer layer (5) used as protection against external stresses. The layers are made from an organic-inorganic hybrid using the sol-gel process. The inventive method is characterised in that an additional layer (4) is disposed on top of the guiding layer (3) in such a way that a symmetrical structure is obtained having the same refractive index around the waveguide device produced in the guiding layer (3). The invention can be used to produce a waveguide component.

L'invention concerne un procédé de fabrication d'un composant guide d'ondes à plusieurs couches empilées sur un substrat en silicium. Ce composant est du type comprenant une couche tampon (2) déposée sur ledit substrat (1), une couche guidante (3) déposée sur la couche tampon et permettant la réalisation d'un dispositif guide d'ondes (6), et une couche extérieure (5) de protection vis-à-vis des agressions extérieures, les couches étant réalisées en un hybride organique-inorganique selon la méthode sol-gel. Le procédé est caractérisé en ce que l'on dépose sur la couche guidante (3) une couche supplémentaire (4) de façon à obtenir une structure symétrique ayant le même indice de réfraction autour du dispositif guide d'ondes réalisé dans la couche guidante (3). L'invention est utilisable pour la réalisation de composant guide d'ondes.

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