Method for manufacturing layer-built material with silicon...

Details Method for manufacturing layer-built material with silicon... Method for manufacturing layer-built material with silicon...

B - Operations, Transporting

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117/143, 117/157

B05D 5/06 (2006.01) B05D 7/02 (2006.01) B05D 7/14 (2006.01) C03C 17/25 (2006.01) C03C 17/42 (2006.01)

Patent

CA 2013660

A method for forming a silicon dioxide film according to the present invention comprises steps of: (i) contacting a substrate with processing solution containing silicofluoric acid solution supersaturated with silicon dioxide, and (ii) forming the silicon dioxide film on the substrate; wherein organic colorants) is/are introduced into the silicon dioxide film by adding organic colorants) to the processing solution. According to the present invention, a silicon dioxide film containing organic colorant without defect such as air bubbles, or undecomposed raw material.

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