Method for manufacturing workpieces with ion-etched surface

H - Electricity – 01 – J

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H01J 37/32 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2721249

Planetary carriers (22) for workpieces mounted on a carousel (19) are provided within a vacuum chamber. A source (24) for a cloud comprising ions (CL) is provided so that a central axis (ACL) of the cloud intercepts the rotary axis (A20) of the carousel (19). The cloud (CL) has an ion density profile at the moving path (T) of planetary axes (A22) which drops to 50 % of the maximum ion density at a distance from the addressed center axis (ACL) which is at most half the diameter of the planetary carriers (22). When workpieces upon the planetary carriers (22) are etched by the cloud comprising ions material which is etched off is substantially not redeposited on neighboring planetary carriers but rather ejected towards the wall of the vacuum chamber.

L'invention porte sur des porte-satellites (22) pour des pièces à usiner montées sur un carrousel (19) qui sont disposés dans une chambre sous vide. Une source (24) pour un nuage comprenant des ions (CL) est prévue, de telle sorte qu'un axe central (ACL) du nuage coupe l'axe de rotation (A20) du carrousel (19). Le nuage (CL) a un profil de densité d'ions au niveau du trajet de déplacement (T) d'axes de satellite (A22) qui chute à 50 % de la densité d'ions maximale à une distance à partir de l'axe central adressé (ACL) qui est au mieux la moitié du diamètre des porte-satellites (22). Lorsque des pièces à usiner sur les porte-satellites (22) sont attaquées par le nuage comprenant des ions, un matériau qui est attaqué est sensiblement non redéposé sur des porte-satellites voisins, mais plutôt éjecté vers la paroi de la chambre sous vide.

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