Method for optimized utilization of base material in the...

G - Physics – 02 – B

Patent

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G02B 6/13 (2006.01) G02B 5/18 (2006.01) G02B 6/124 (2006.01) G03F 1/00 (2006.01) G03F 7/20 (2006.01) H01S 5/02 (2006.01) H01S 5/10 (2006.01) G02B 6/12 (2006.01) H01S 5/12 (2006.01) H01S 5/125 (2006.01)

Patent

CA 2177650

] Disclosed is a method for the optimum utilization of disk-shaped base material in the manufacture of optoelectronic components with variable-period grating. The method helps avoid material losses by arranging optoelectronic components on a disk-shaped base material in an optimum manner and is based on obtaining variants of nominally identical individual component patterns by mathematical rotation and mirroring, forming a unit cell through shifting of the individual component pattern variants, and reproducing the unit cell in the x and y directions until the active surface of the mask or the entire surface of the disk-shaped base material is tightly covered. The method may be used for the manufacture of photonic components based on DFB, DBR, or sampled grating structures.

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