C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 16/04 (2006.01)
Patent
CA 2693039
The invention relates to a method for plasma-assisted chemical vapour deposition for coating or material removal on the inner wall of a hollow body (42). The method involves introducing a gas lance (44) into the hollow body (42) and forming a cavity plasma (45) to form a plasma cloud arranged at the tip of the gas lance by applying an electric radio-frequency field to an RF electrode (41). (Figure 4)
La présente invention concerne un procédé de séparation chimique en phase gazeuse assistée par plasma permettant le revêtement ou l'enlèvement de matière sur la paroi intérieure d'un corps creux (42). Selon l'invention, une lance à gaz (44) est introduite dans le corps creux (42) et un plasma de corps creux (45) est formé par application d'un champ électrique haute fréquence à une électrode HF (41), par formation d'un nuage de plasma au niveau de la pointe de la lance à gaz.
Ridout & Maybee Llp
Stein Ralf
LandOfFree
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