C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
204/18, 117/75
C23C 18/22 (2006.01) H05K 1/03 (2006.01) H05K 3/18 (2006.01) H05K 3/38 (2006.01)
Patent
CA 1250543
ABSTRACT OF THE DISCLOSURE A method for plating a polyamide resin molded article which comprises carrying out, before plating treat- ment, etching treatments, namely the first etching treatment with an aqueous stannic chloride solution and then the second etching treatment with an aqueous acid solution, and brings about a plating effect excellent in strength of adhesion of the plating film and in plating appearance.
467757
Gowling Lafleur Henderson Llp
Mitsubishi Rayon Co. Ltd.
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