C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
C23C 14/34 (2006.01) C23C 14/06 (2006.01)
Patent
CA 2596622
The invention concerns a method for preparing a thermal projection, in particular with plasma, a target, said target comprising at least one compound based on atoms of a different type selected in particular among constituents M belonging to the family (Zr, Mo, Ti, Nb, Ta, Hf, Cr) and silicon. The invention is characterized in that it consists in injecting at least one fraction of said compound whereof the constituents are bound by covalent and/or ionic and/or metallic bonds in a plasma propellant, said plasma propellant spraying the constituents of said compound on the target so as to obtain a deposition of said compound at a portion of the surface of said target.
Procédé d'élaboration par projection thermique, notamment par voie plasma, d'une cible, ladite cible comprenant au moins un composé à base d'atomes de nature différente choisis notamment parmi les constituants M appartenant à la famille (Zr, Mo, Ti, Nb, Ta, Hf, Cr) et du silicium, caractérisé en ce qu'on injecte au moins une fraction dudit composé dont les constituants sont liés par liaisons covalentes et/ou ioniques et/ou métalliques dans un propulseur plasma, ledit propulseur plasma projetant les constituants dudit composé sur la cible de manière à obtenir un dépôt dudit composé au niveau d'une portion de surface de ladite cible.
Billieres Dominique
Nadaud Nicolas
Goudreau Gage Dubuc
Saint-Gobain Glass France
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