Method for preparing implant surfaces

Details Method for preparing implant surfaces Method for preparing implant surfaces

C - Chemistry, Metallurgy

23

C

C23C 4/02 (2006.01) A61F 2/30 (2006.01) A61L 2/14 (2006.01) A61L 27/06 (2006.01) A61L 27/10 (2006.01) C23C 8/10 (2006.01) C23C 8/36 (2006.01) A61F 2/00 (2006.01)

Patent

CA 2110732

ABSTRACT The invention relates to a method and device for preparing implant surfaces of metallic or ceramic material, preferably titanium, using gas-discharge plasma with the aim of obtaining a well-defined and reproducible implant surface. After machining and any washing procedures which may be necessary, the implants (2) are conveyed to a vacuum chamber (K2) in which the plasma preparation is carried out in two steps. Firstly, a treatment with an inert gas plasma is effected so that existing surface contamination layers and oxide layers are removed from the implant. A reoxidation is then effected using an oxidizing plasma or by means of thermal oxidation. The plasma preparation and any remaining preparation steps which may be necessary, and handling of the implants (2), are carried out in accordance with a closed procedure without intermediate exposure to uncontrolled environmental atmospheres. In this way, a higher grade of controlled surface characteristics and reproducibility is obtained for the surface of the implant as compared with previously used methods. The properties of the plasma-prepared surface can be pre- served right up to the moment of use.

Affiliated with

Also associated with

Rating

Method for preparing implant surfaces does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for preparing implant surfaces, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for preparing implant surfaces will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-2040534