C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/267.2, 260/2
C07D 211/32 (2006.01) C07D 211/14 (2006.01) C07D 211/18 (2006.01) C07D 211/52 (2006.01) C07D 295/108 (2006.01) C07D 295/12 (2006.01) C07D 307/33 (2006.01) C07D 317/16 (2006.01) C07D 471/10 (2006.01)
Patent
CA 1084500
Abstract of the Disclosure: Novel compounds of the formula: Image wherein R is a hydrogen of fluorine atom, W is an oxygen atom or an ethylenedioxy or ethylenedithio group and Z is a certain secondary amino group, which are useful as central nervous system depressants, can be prepared by the reaction of a compound of the formula: Image wherein X is a halogen atom and R and W are each as defined above with a secondary amine of the Formula: N-Z wherein Z is as defined above, in case of W being ethylenedioxy or ethylenedithio, optionally followed by hydrolysis and can be reduced to give a compound of the formula: Image wherein R and Z are each as defined above, which are known to be useful as antipsychotic and/or analgesic agents. - 1 -
257086
Inaba Shigeho
Motoike Yasuo
Ono Keiichi
Sasajima Kikuo
Yamamoto Hisao
Kirby Eades Gale Baker
Sumitomo Chemical Co. Ltd.
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