Method for preparing vaporized reactants for chemical vapor...

Details Method for preparing vaporized reactants for chemical vapor... Method for preparing vaporized reactants for chemical vapor...

C - Chemistry, Metallurgy

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C

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C23C 16/00 (2006.01) C03B 37/014 (2006.01) C03C 17/09 (2006.01) C03C 17/245 (2006.01) C23C 16/44 (2006.01) C23C 16/448 (2006.01)

Patent

CA 2027761

ABSTRACT Vaporized reactants, useful for chemical vapor deposition of a coating on the surface of a hot substrate, are prepared by initially heating a liquid coating precursor, injecting the liquid coating precursor into a vaporization chamber, simultaneously admitting a blend gas into the vaporization chamber, heating the liquid and blend gas to cause the liquid to vaporize at a temperature below its standard vaporization temperature, and thoroughly mixing the coating precursor vapor and blend gas, to produce a stream of vaporized reactant for pyrolytic decomposition at the surface of the hot substrate. A horizontal thin film evaporator provides a particularly suitable vaporization chamber for the present process.

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