Method for pretreating substrates for pvd methods

C - Chemistry – Metallurgy – 23 – C

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C23C 14/02 (2006.01) C23C 14/32 (2006.01)

Patent

CA 2743988

The invention relates to a method for surface treatment of work pieces in a vacuum treatment system having a first electrode embodied as a target, which is part of an arc vaporization source; by means of the first electrode, an are is operated with an arc current and vaporizes material from the target that is deposited at least partially and intermittently onto the work pieces and having a second electrode that is embodied as a work piece holder and, together with the work pieces, constitutes a bias electrode; by means of a voltage supply, a bias voltage is applied to the bias electrode, with the bias voltage applied so that it is matched to the arc current such that essentially, no net material buildup on the surface occurs.

La présente invention concerne un procédé pour traiter en surface des pièces à usiner dans un système de traitement sous vide ayant une première électrode conçue sous forme de cible qui fait partie dune source dévaporation par arc cathodique. Selon ce procédé, une étincelle est provoquée par un courant dallumage sur la première électrode, étincelle grâce à laquelle le matériau de la cible est évaporé. Le matériau se dépose au moins partiellement et périodiquement sur les pièces. Le système a en outre une seconde électrode qui est conçue comme un dispositif de retenue de pièce à usiner et qui forme une électrode de polarisation avec les pièces. On applique sur l'électrode de polarisation une tension de polarisation au moyen dune source de tension. Cette tension de polarisation est appliquée de façon coordonnée avec le courant dallumage, de manière à ce quil ne se produise clairement pratiquement aucune accumulation de matériau à la surface.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method for pretreating substrates for pvd methods does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for pretreating substrates for pvd methods, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for pretreating substrates for pvd methods will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1512892

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.