C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
260/566.9
C07C 45/58 (2006.01) C07C 47/20 (2006.01) C07D 303/04 (2006.01) C07D 303/22 (2006.01)
Patent
CA 1248140
Abstract of the disclosure: A 2-(substituted aryl)propionaldehyde of the formula, Image (wherein Ar denotes Image is produced in high yield by reacting a methyl (substituted aryl) ketone of the formula, Ar-?-CH3 with phenyldimethylsulfonium methylsulfate of the formula, Image in the presence of alkali metal hydroxide to obtain a re- action mixture containing 2-(substituted aryl)1,2-epoxy- propane of the formula, Image and thioanisole, and subjecting the reaction mixture to contact with anhydrous MgCl2. The propionaldehyde compound is also produced in high yield by contacting the epoxy- propane compound with anhydrous MgCl2 in the presence of a soft nucleophile such as a sulfide, a thiol and a phosphine.
509322
Arashida Susumu
Maeda Sadayuki
Shimizu Iwao
Shinoo Yasutaka
Takenaka Shinji
Hamari Chemicals Ltd.
Riches Mckenzie & Herbert Llp
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