G - Physics – 21 – F
Patent
G - Physics
21
F
31/156, 402/318,
G21F 1/10 (2006.01) C08F 220/06 (2006.01) C08L 33/02 (2006.01)
Patent
CA 1081898
ABSTRACT OF THE DISCLOSURE A method for producing a lead containing monomer composition comprising reacting a mixture comprising (1) at least one monomer selected from the group consisting of alkyl methacrylate having 1 - 4 carbon atoms in an alkyl group, hydroxyalkyl acrylate, hydroxyalkyl methacrylate and styrene, (2) acrylic or methacrylic acid, (3) an organic acid having the general formula: R1COOH, wherein R1 is is hydrocarbon residue having 5 - 20 carbon atoms and optionally (4) an organic acid having the general formula R2COOH, wherein R2 is hydrocarbon residue having 2 - 4 carbon atoms with lead monoxide. The composition is polymerized to obtain a radiation shielding polymer.
291233
Nagai Haruo
Nunokawa Kunikazu
Uehara Hiroshi
Kyowa Gas Chemical Industry Co. Ltd.
Sim & Mcburney
LandOfFree
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