H - Electricity – 01 – C
Patent
H - Electricity
01
C
117/78
H01C 17/18 (2006.01) C23C 18/18 (2006.01) C23C 18/50 (2006.01) H05K 1/16 (2006.01) H05K 3/18 (2006.01)
Patent
CA 1046357
ABSTRACT OF THE DISCLOSURE This invention discloses a novel process for the production of metal film resistors by electrodeless plating. It consists of treating a base material to one of the following treatments: 1) soaking the base material in a solution of stannous chloride, a silver salt and palladium chloride; 2) heating the base material in an atmosphere which will not oxidize the material and then subjecting the material to a surface treatment in an atmosphere wherein the material will be oxidized; 3) treating the material as in paragraph 2) above and then teating the material to the solution of paragraph 1) above. The base material is then soaked in an electrodeless plating bath containing metallic salts, a reducing agent, an acetifying agent, cobalt ion (0.016-0.038 mole/liter), sodium hypophosphate, sodium citrate, and one or more members selected from the group consisting of sodium tartrate, and sodium malate, the pH being between 9.5 and 10.5 and the temperature of the bath being between 20°C and 50°C. The resistors produced by the method of the present invention show consistent characteristics and improved reliability over those of the prior art. The surfaces of the activated film are very even eliminating inconsistent products.
200334
Hamaguchi Hachiro
Takahama Hiroshi
Hamaguchi Hachiro
Takahama Hiroshi
LandOfFree
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