D - Textiles – Paper – 21 – F
Patent
D - Textiles, Paper
21
F
D21F 11/00 (2006.01) D21F 1/00 (2006.01)
Patent
CA 2733338
The invention relates to a method for producing a polymer topographic pattern on a continuous strip which has a longitudinal orientation and transverse orientation perpendicular thereto, the pattern being applied to an area of the continuous strip to be imprinted by means of an application device and the application device moving in relation to the strip in a basic movement which is parallel to the transverse orientation of the strip to produce the pattern. The invention is characterized in that during production of the pattern i) the position of the continuous strip parallel to its transverse orientation, especially relative to a stationary reference position, is measured and ii) the position of the application device is changed by a correction movement parallel to the transverse orientation of the continuous strip when the position of the continuous strip parallel to its transverse orientation is changed, the correction movement being superimposed to the basic movement.
L'invention concerne un procédé pour créer un motif topographique polymère sur une bande continue présentant un sens longitudinal et un sens transversal perpendiculaire à celui-ci, ce motif étant appliqué au moyen d'un dispositif d'application sur une surface à imprimer de la bande continue et le dispositif d'application se déplaçant par rapport à la bande selon un mouvement de base orienté parallèlement au sens transversal de la bande pour créer le motif. L'invention se caractérise en ce que, pendant la création du motif, i) la position de la bande continue parallèlement à son sens transversal, en particulier par rapport à une position de référence fixe, est mesurée et ii) en cas de modification de la position de la bande continue parallèlement à son sens transversal, la position du dispositif d'application est modifiée par un mouvement de correction orienté parallèlement au sens transversal de la bande continue, ce mouvement de correction étant superposé au mouvement de base.
Allum Andrew
Douglas Stephen
Jeffery John
Morton Antony
Ponton David Stuart
Sim & Mcburney
Voith Patent Gmbh
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