Method for producing a positive photoresist

Details Method for producing a positive photoresist Method for producing a positive photoresist

G - Physics

03

F

96/256

G03F 7/26 (2006.01) G03F 7/022 (2006.01) G03F 7/20 (2006.01)

Patent

CA 1263822

ABSTRACT OF THE DISCLOSURE The invention provides a method for producing a positive working photoresist which comprises coating at least one novolak resin, and l,2-naphthoquinone-2-diazide-4-sulfonic acid ester of 2,3,4-trihydroxy benzophenone onto a substrate, exposing to a u.v. light source having a wavelength of less than 380 nanometers and developing with an aqueous alkaline solution.

490081

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