Method for producing a tapered waveguide

Details Method for producing a tapered waveguide Method for producing a tapered waveguide

G - Physics

02

B

G02B 6/12 (2006.01) G02B 6/122 (2006.01) G02B 6/132 (2006.01) H01P 11/00 (2006.01)

Patent

CA 2135091

A method for producing a tapered waveguide layer is disclosed. The method includes the steps of: forming a resist pattern on a substrate; setting the substrate in an apparatus for forming a film such that particles constituting the film reach the substrate from a direction which is oblique relative to the substrate; forming the film on a region of a surface of the substrate which is not covered by the resist pattern, the film having a thickness distribution corresponding to a shadow which the resist pattern creates on the substrate in accordance with an angle between the substrate and the direction; and removing the resist pattern, thereby forming the tapered waveguide layer consisting of the film on the substrate.

Méthode pour générer une couche guide d'ondes profilée. La méthode comprend les étapes suivantes : former un motif de résist sur le substrat; placer le substrat dans un appareil pour créer une pellicule de sorte que les particules de cette dernière atteignent le substrat dans un sens oblique; former la pellicule sur une partie du substrat qui n'est pas recouverte par le motif du résist, la pellicule comportant une répartition de l'épaisseur qui correspond à une ombre créée sur le substrat par le motif du résist selon un angle entre le substrat et le sens; enlever le motif sur le résist pour former ainsi une couche guide d'ondes profilée composée de la pellicule sur le substrat.

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