Method for producing aluminum holographic masters

Details Method for producing aluminum holographic masters Method for producing aluminum holographic masters

G - Physics

03

H

88/0.12

G03H 1/18 (2006.01) C25D 1/10 (2006.01) G02B 1/00 (2006.01) G02B 5/32 (2006.01) G03F 7/00 (2006.01) G03H 1/02 (2006.01)

Patent

CA 1045428

METHOD FOR PRODUCING ALUMINUM HOLOGRAPHIC MASTERS ABSTRACT A master for replicating surface relief holo- grams is prepared by depositing a photoresist on the surface of an amorphous aluminum substrate, exposing the photorosist to an interference pattern, developing the photoresist to record the interference pattern as a surface relief pattern, transferring the surface relief pattern onto the surface of the aluminum substrate, removing the remaining photoresist, and anodizing the aluminum surface. This method is particularly useful in making masters for surface relief focused image holograms whose surface dimensions are in the order of one micron or less.

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