Method for producing an opto-electronic integrated circuit

Details Method for producing an opto-electronic integrated circuit Method for producing an opto-electronic integrated circuit

H - Electricity

01

L

345/18, 345/27

H01L 27/14 (2006.01) H01L 27/06 (2006.01) H01L 27/144 (2006.01) H01L 29/205 (2006.01)

Patent

CA 1301897

Abstract of the Disclosure Present invention is to provide a process for producing an opto-electronic integrated circuit comprising a field effect transistor as an electronic device and a photo-diode as an optical device both formed on an InP substrate, the field effect transistor comprising a high electron mobility transistor having: a GaInAs layer epitaxially grown on the InP substrate in a preset region thereof, a n-AlInAs layer epitaxially grown on the GaInAs layer, a gate electrode formed on the AlInAs layer, and a source electrode and a drain electrode formed on the AlInAs layer with the gate electrode therebetween, and the photo-diode comprising a PIN photo-diode having: the GaInAs layer epitaxially grown on the InP substrate near the region of the field effect transistor simultaneously with the growth of that of the field effect transistor, the n-AlInAs layer epitaxially grown on the GaInAs layer simultaneously with the growth of that of the field effect transistor, a n-InP layer epitaxially grown on the n-AlInAs layer, an undoped GaInAs layer epitaxially grown on the n-InP layer in a preset region thereof, a p-GaInAs layer epitaxially grown on the undoped GaInAs layer, an anode electrode formed on the p-GaInAs layer, and a cathode electrode formed on the n-InP layer near the undoped GaInAs layer.

591787

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