C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
C07D 213/48 (2006.01) C07C 47/575 (2006.01) C07D 213/30 (2006.01) C07D 249/02 (2006.01) C07D 257/04 (2006.01) C07D 277/24 (2006.01) C07D 307/46 (2006.01) C07D 333/22 (2006.01) C07D 417/12 (2006.01)
Patent
CA 2063851
A compound of the formula: A-CH2CH2-O-B [wherein A stands for an aromatic ring residue, a group shown by R1-CO- (wherein R1 stands for an aliphatic hydrocarbon residue, aromatic hydrocarbon residue, a heterocyclic residue, an aromatic alipahtic hydrocarbon residue or an alicyclic hydrocarbon residue) or R2- CH=CH- (wherein R2 stands for an aliphatic hydrocarbon residue, an aromatic hydrocarbon residue, a heterocyclic residue, an aromatic aliphatic hydrocarbon residue or an alicyclic hydrocarbon residue), and B stands for an aromatic ring residue], can be obtained in high yield, at high purity level by short reaction time, by reacting a compound of the formula: A-CH2CH2-X (wherein A is of the same meaning as defined above, and X stands for a leaving group) with a compound represented by the general formula: MO-B (wherein M stands for an alkali metal atom ar an alkaline earth metal atom and B is of the same meaning as defined above) in a non aqueous solvent.
Arita Miichiro
Mizuno Yukio
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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