Method for producing flat cvd diamond film

C - Chemistry – Metallurgy – 30 – B

Patent

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Details

C30B 29/04 (2006.01) C23C 16/01 (2006.01) C23C 16/27 (2006.01) C23C 16/458 (2006.01)

Patent

CA 2082728

GEMAT 10 (60-SD-580) METHOD FOR PRODUCING FLAT CVD DIAMOND FILM Abstract of the Disclosure A chemical vapor deposition method for producing a flat diamond film substantially free of cracks by forming the diamond film on the surface of a substrate having a convex growth surface wherein the radius of curvature is matched with the tensile stress within the diamond coating produced to compensate for distortion when the film is separated from the substrate.

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