Method for producing high purity silicon

C - Chemistry – Metallurgy – 01 – B

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Details

C01B 33/037 (2006.01) C01B 33/02 (2006.01) C30B 29/06 (2006.01)

Patent

CA 2744802

The present invention relates to a method for producing high purity silicon comprising providing molten silicon containing 1-10% by weight of calcium, casting the molten silicon, crushing the silicon and subjecting the crushed silicon to a first leaching step in an aqueous solution of HCI and/or HCI + FeCI3 and to a second leaching step in an aqueous solution of HF and HNO3. The leached silicon particles is thereafter subjected to heat treatment at a temperature of between 1250°C and 14200C for a period of at least 20 minutes and the heat treated silicon is subjected to a third leaching step in an aqueous solution of HF and HNO3.

La présente invention porte sur un procédé de fabrication d'un silicium de haute pureté consistant à se procurer du silicium fondu contenant 1-10 % en poids de calcium, à couler le silicium fondu, à broyer le silicium et à soumettre le silicium broyé à une première étape de lixiviation dans une solution aqueuse de HCl et/ou HCl + FeCl3 et à une seconde étape de lixiviation dans une solution aqueuse de HF et HNO3. Les particules de silicium lixivié sont par la suite soumises à un traitement thermique à une température entre 1 250°C et 1 420°C pendant une période de temps d'au moins 20 minutes et le silicium traité thermiquement est soumis à une troisième étape de lixiviation dans une solution aqueuse de HF et HNO3.

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