Method for producing high-purity solutions using gaseous...

C - Chemistry – Metallurgy – 01 – B

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C01B 7/19 (2006.01) C01B 7/01 (2006.01) C01B 7/09 (2006.01) C01C 1/16 (2006.01) C09K 13/08 (2006.01) H01L 21/306 (2006.01) H01L 21/311 (2006.01)

Patent

CA 2368441

The invention relates to a method for producing a high-purity solution that contains hydrogen fluoride or a salt thereof or a mixture of two or more thereof. The inventive method comprises the following step (i): hydrogen fluoride is passed into at least one anhydrous solvant. The method is characterised in that hydrogen fluoride is passed into the at least one anhydrous solvant as a gas or liquid gas or as a mixture of gas and liquid gas.

Procédé de production d'une solution de haute pureté contenant de l'acide fluorhydrique ou un sel de celui-ci ou un mélange des deux ou plus de ces produits, comprenant l'étape suivante (1) consistant à introduire de l'acide fluorhydrique dans au moins un solvant anhydre, caractérisé en ce que l'acide fluorhydrique est introduit sous forme de gaz ou de gaz liquéfié, ou d'un mélange de gaz et de gaz liquéfié dans au moins un solvant anhydre.

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