Method for producing semi-insulating resistivity in high...

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H01L 21/324 (2006.01) C30B 29/36 (2006.01) C30B 33/00 (2006.01) C30B 33/02 (2006.01)

Patent

CA 2485594

A method is disclosed for producing high quality semi-insulating silicon carbide crystals in the absence of relevant amounts of deep level trapping elements. The invention includes the steps of heating a silicon carbide crystal having a first concentration of point defect related deep level states to a temperature above the temperatures required for CVD growth of silicon carbide from source gases, but less than the sublimation temperature of silicon carbide under the ambient conditions to thereby thermodynamically increase the number of point defects and resulting states in the crystal, and then cooling the heated crystal to approach room temperature at a sufficiently rapid rate to maintain a concentration of point defects in the cooled crystal that remains greater than the first concentration.

L'invention porte sur un procédé de production de cristaux en carbure de silicium semi-isolants, de haute qualité, en l'absence de quantités appropriées d'éléments de capture en niveau profond. Le procédé consiste à chauffer un cristal en carbure de silicium ayant une première concentration de défauts ponctuels liés à des états en niveau profond à une température supérieure aux températures requises pour l'étirage par procédé CVD du carbure de silicium provenant de gaz sources, mais inférieure à la température de sublimation du carbure de silicium dans des conditions ambiantes afin d'augmenter de manière thermodynamique le nombre de défauts ponctuels et des états résultants du cristal, puis à refroidir le cristal chauffé pour approcher une température ambiante à une vitesse suffisamment rapide pour maintenir une concentration des défauts ponctuels dans le cristal refroidi qui est supérieure à la première concentration.

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