Method for producing trichloromonosilane

C - Chemistry – Metallurgy – 01 – B

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C01B 33/107 (2006.01)

Patent

CA 2003168

The present application relates to a method for production of trichloromonosilane in a fluidized bed reactor by reaction of silicon powder and HCl at a temperature between 280 and 300°C wherein silicon powder which has been produced by gas atomization of molten silicon is used. The gas atomized silicon powder has a preferred particle size between 1 and 1000 µm.

La présente application s'applique à une méthode pour l'obtention d'un trichloromonosilane dans un réacteur à lit fluidisé par réaction d'une poudre de silicium et de HCl à une température comprise entre 280 et 300 degrés C, où on utilise la poudre de silicium produite par atomisation gazeuse de silicium fondu. La poudre de silicium ainsi obtenue a une taille granulométrique se situant de préférence entre 1 et 1000 µm.

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