Method for producing uv absorption layers on substrates

B - Operations – Transporting – 05 – D

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Details

B05D 3/06 (2006.01) B05D 3/14 (2006.01) B05D 7/04 (2006.01) C08J 7/06 (2006.01) C08J 7/18 (2006.01) B05D 3/02 (2006.01)

Patent

CA 2501593

The invention relates to a method for producing UV absorption layers on organic or inorganic substrates. The inventive method consists in a) acting by a low-temperature plasma, or a corona discharge, or energy-rich radiation on an organic or inorganic substrate, b) in applying at least one radical forming initiator and at least one UV absorber containing at least one unsaturated ethylene group, and a synergist agent and/or an unsaturated ethylene compound eventually in the form of a molten material, solutions, suspensions or emulsions to said organic or inorganic substrates; and c) heating the coated substrate and/or irradiating it with electromagnetic waves. The inventive substrate provided with an UV absorption layer is also disclosed. Said method generally excludes vacuum conditions, a high energetic or thermal load, and the fracture of the UV absorber. Said invention makes it possible to produce transparent UV absorption layers which exhibit high adherence ability and whose properties are usefully modulated, for example like optical density.

L'invention concerne un procédé pour créer des couches d'absorption d'UV sur un substrat organique ou inorganique. L'invention est caractérisée en ce que a) on fait agir un plasma basse température, une décharge couronne ou un rayonnement riche en énergie sur le substrat organique ou inorganique, b) on met sur le substrat organique ou inorganique traité au moins un amorceur formant des radicaux et au moins un absorbeur d'UV contenant au moins une groupe éthyléniquement insaturé, et, éventuellement sous forme de matières fondues, de solutions, de suspensions ou d'émulsions, au moins un agent synergiste et/ou un composé éthyléniquement insaturé, c) on chauffe le substrat enduit et/ou on l'irradie d'ondes électromagnétiques. La présente invention porte également sur un substrat doté d'une couche d'absorption d'UV selon ledit procédé. Ce procédé exclut la plupart du temps des conditions de vide et une sollicitation énergétique ou thermique trop importante, ainsi que la destruction de l'absorbeur d'UV. Cette invention permet de réaliser des couches d'absorption d'UV transparentes et de bonne adhérence, dont les propriétés sont avantageusement modulables comme, par exemple, la densité optique.

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