C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/100
C07D 501/04 (2006.01) A61K 31/545 (2006.01) C07D 501/18 (2006.01) C07D 501/20 (2006.01) C07D 501/24 (2006.01) C07D 501/26 (2006.01) C07D 501/46 (2006.01) C07D 519/06 (2006.01) C07F 7/10 (2006.01)
Patent
CA 1293718
24205-711 Abstract A method for producing a compound of the formula; Image [I] which R stands for a hydrogen atom, an acyl group or a protective group other than acyl groups, Q stands for a hydrogen atom or an ester residue, Y stands for the residue of a nucleophilic compound and the dotted line snows the double bond at 2- or 3- position of the cephem ring or a salt thereof, characterized by allowing a compound of the formula; Image [II] [R, Q and the dotted line are of the same meaning as above] or a salt thereof to react with a nucleophilic compound or a salt thereof and a compound of the formula; [III] Image wherein R1, R2, and R3 independently stand for a hydrocarbon group having not more than 8 carbon atoms, or R1 and R2, R1 and R3 or R2 and R3 may be combined to form polymethylene group, according to which the end product [I] of high quality can be provided in a high yield by one reaction step by using the compound [III] of relatively low cost, thus the method of this invention is advantageous for mass-producing the compound [I] on an industrial scale from the compound [II] and a nucleophilic compound.
530758
Ishibashi Yukio
Naito Kenzo
Fetherstonhaugh & Co.
Takeda Chemical Industries Ltd.
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