Method for purifying semiconductor gases

Details Method for purifying semiconductor gases Method for purifying semiconductor gases

B - Operations, Transporting

01

D

B01D 53/04 (2006.01) B01D 3/00 (2006.01) B01D 53/34 (2006.01) B01J 29/00 (2006.01) C01B 21/04 (2006.01) C01B 23/00 (2006.01) C01C 1/02 (2006.01) F25J 3/06 (2006.01) F25J 3/08 (2006.01)

Patent

CA 2365027

This invention is directed a method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a) passing the impure liquefied gas through a first absorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b) passing the first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c) passing the second purified gas through a second absorption means to remove impurities from the vapor phase therein to produce the ultra-high purity gas.

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