Method for reducing facet reflectivities of semiconductor...

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345/12, 88/97.6

H01S 3/06 (2006.01) G02F 1/035 (2006.01) H01S 5/50 (2006.01) H01S 5/028 (2006.01) H01S 5/16 (2006.01)

Patent

CA 2017732

89-3-614 METHOD FOR REDUCING FACET REFLECTIVITIES OF SEMICONDUCTOR LIGHT SOURCES AND DEVICE THEREOF ABSTRACT A novel method for reducing the facet reflectivities of semiconductor light sources and amplifiers concerns the use of a bulk (non-waveguiding) index-matched regrown end cap region at both of the major facet surfaces of the amplifier. The amplifier has a tilted stripe geometry which, in combination with the end cap regions, enable the amplifier to reproducibly achieve facet reflectivities of less than 10-5 while avoiding a facet coating step. The improved optical amplifier is more amenable to mass production and less sensitive to both wavelength and polarization.

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