Method for removing sulphur, nitrogen and halogen impurities...

B - Operations – Transporting – 01 – D

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B01D 53/52 (2006.01) B01D 53/68 (2006.01) B01D 53/75 (2006.01) B01D 53/86 (2006.01) C01B 3/50 (2006.01) C10K 1/32 (2006.01) C10K 1/34 (2006.01)

Patent

CA 2748004

The invention relates to a method for the ultimate removal of sulphur, nitrogen and halogen impurities from a synthetic gas, wherein said method includes: a) the combined step of hydrolysing COS and HCN contained in the gas and trapping the halogen compounds using a TiO2 catalyst; b) the step of scrubbing using a solvent; a step of desulphurization on a trapping mass or adsorbent. The synthetic gas purified according to the method of the invention contains less than 10 wt ppb of sulphur-containing impurities, less than 10 wt ppb of nitrogen impurities, and less than 10 wt ppb of halogen impurities.

Procédé d'élimination ultime d'impuretés soufrées, azotées et halogénées contenues dans un gaz de synthèse, ledit procédé comprenant : a) une étape conjointe d'hydrolyse de COS et HCN contenus dans le gaz et de captation des composés halogènes, utilisant un catalyseur à base de Ti02, b) une étape de lavage par un solvant, c) une étape de désulfuration sur une masse de captation ou adsorbant. Le gaz de synthèse purifié selon ce procédé de l'invention contient moins de 10 ppb poids, moins de 10 ppb poids d'impuretés azotées et moins de 10 ppb poids d'impuretés halogénées.

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