Method for selective intermixing of layered structures...

H - Electricity – 01 – L

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

356/176, 345/26,

H01L 21/268 (2006.01) H01L 21/18 (2006.01) H01L 21/225 (2006.01) H01L 21/263 (2006.01) H01L 29/205 (2006.01)

Patent

CA 1277439

ABSTRACT A multilayer semiconductor structure, formed of two or more separate layers of different materials can be selectively intermixed so as to become compositionally modified, such that the distinction between the different original materials is lost, at least partially. This intermixing process employs irradiation with a pulsed or rapidly scanned laser or electron beam, generally at ambient conditions of temperature and pressure, at energy levels which avoid physical damage to the layered structure. The intermixing may be more complete when multiple pulses from the laser or electron beam are employed.

548660

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Method for selective intermixing of layered structures... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for selective intermixing of layered structures..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for selective intermixing of layered structures... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1277465

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.