Method for supplying gas to a chamber and method for...

G - Physics – 05 – D

Patent

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Details

G05D 11/02 (2006.01) B23K 1/008 (2006.01) B23K 3/08 (2006.01) G05D 11/13 (2006.01)

Patent

CA 2247515

The invention concerns a method for the gas supply of a chamber (3, 12) supplied by a supply network comprising at least a primary line (1, 9, 10), connected in its upstream part to a source of said gas (5), and at least two respective secondary lines (1i, 9i, 10i) connected to the primary line. The method is characterised in that it consists in measuring the content of one given element in the atmosphere of the chamber in at least one point of the chamber, comparing the measured content with at least one predetermined reference value for the content of said element in the atmosphere of the chamber in said point, and varying, if required, depending on the result of this comparison, the gas pressure at one of the points (Ai) of the network.

L'invention concerne un procédé d'alimentation en gaz d'une enceinte (3, 12), qui est alimentée par un réseau d'alimentation comportant au moins une ligne primaire (1, 9, 10), reliée en sa partie amont à une source dudit gaz (5), et au moins deux lignes secondaires respectives (1i, 9i, 10i) connectées à la ligne primaire, se caractérisant en ce que l'on mesure la teneur, en un élément donné, de l'atmosphère de l'enceinte, en au moins un point de l'enceinte, l'on effectue une comparaison de la teneur mesurée avec au moins une valeur de consigne déterminée pour la teneur en ledit élément de l'atmosphère de l'enceinte en ledit point, et l'on fait varier, le cas échéant, selon le résultat de cette comparaison la pression du gaz au niveau d'un des points (A i) du réseau.

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