Method for the densification of thin porous substrates by...

C - Chemistry – Metallurgy – 23 – C

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C23C 16/455 (2006.01) C23C 16/04 (2006.01) C23C 16/458 (2006.01)

Patent

CA 2597253

The invention relates to a method for the densification of thin porous substrates (1) by means of vapour phase chemical infiltration. The inventive method involves the use of a loading tool (19) comprising a tubular conduit (11) which is disposed between first and second plates (12, 13) and around which the thin substrates to be densified are disposed in a radial manner. Once loaded, the tool is disposed inside a reaction chamber (20) of an infiltration furnace having a reactive gas inlet (21) that is connected to the tubular conduit (11) in order to enable a reactive gas to enter the conduit which distributes the gas along the length of the main faces of the substrates (1) in an essentially-radial direction of flow. The reactive gas can also flow in the opposite direction, i.e. into the tool (10) from the outer casing (16) of same and discharged through the conduit (11).

Pour réaliser la densificatîon de substrats poreux minces (1) par infiltration chimique en phase vapeur, l'invention propose l'utilisation d'un outillage de chargement (10) comprenant un conduit tubulaire (11) disposé entre des premier et second plateaux (12, 13) et autour duquel sont disposés radialement les substrats minces à densifier. L'outillage ainsi chargé est alors disposé à l'intérieur d'une chambre de réaction (20), d'un four d'infiltration dont l'entrée d'admission en gaz réactif (21) est raccordée au conduit tubulaire (11) pour permettre l'admission d'un gaz réactif dans le conduit qui distribue le gaz le long des faces principales des substrats (1) suivant une direction d'écoulement essentiellement radiale. Le gaz réactif peut également circuler dans l'autre sens, c'est-à-dire être admis dans l'outillage (10) à partir de l'enveloppe externe (16) de celui-ci et être évacué par le conduit (11).

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