C - Chemistry – Metallurgy – 23 – C
Patent
C - Chemistry, Metallurgy
23
C
316/38
C23C 16/50 (2006.01) C23C 16/04 (2006.01) C23C 16/509 (2006.01)
Patent
CA 1258089
17 ABSTRACT "Method for the glow discharge-activated reactive deposition of electrically conductive material from a gas phase." For the reactive deposition of tubular bodies of electrically conductive material from a flowing gas phase on a tubular substrate (1) a glow discharge 11 is produced between an inner electrode 6 and an outer electrode 2 one of which is constructed so as to be tubular and serves as a substrate. It is ensured that the electrodes 2, 6 are not short-circuited by growing conductive surface layers so that the glow discharge 11 extinguishes. Furthermore, the electrically conductive coating on the electrode 6 not functioning as the substrate electrode is interrupted in an insulating manner to limit the glow discharge 11 locally. For example by a gas barrier the deposit of an electrically conducting deposit on the insulation can be avoided. The glow discharge 11 is reciprocated during the deposition process. Figure 1.
508098
Gartner Georg F.
Janiel Peter A.
Lydtin Hans-Jurgen
Fetherstonhaugh & Co.
Koninklijke Philips Electronics N.v.
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