Method for the manufacture of lasers with tapered guide region

Details Method for the manufacture of lasers with tapered guide region Method for the manufacture of lasers with tapered guide region

H - Electricity

01

S

H01S 5/10 (2006.01) G02B 6/122 (2006.01) G02B 6/12 (2006.01)

Patent

CA 2249398

The laterally tapered active region (3, 3a) is obtained by means of photolithography techniques, in two successive steps, by overlaying the images of a first and a second mask (5, 6) each presenting a chamfer whose inclination corresponds to the inclination of one of the sides of the tapered region (3a).

On obtient une région active biseautée (3, 3a) à l'aide de techniques de photolithographie, en deux étapes successives, en superposant les images d'un premier et d'un second masque (5, 6) dont chacune présente un chanfrein dont l'inclinaison correspond à celle de l'un des côtés de la partie en biseau (3a).

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