Method for the plasma cleaning of the surface of a material...

C - Chemistry – Metallurgy – 23 – G

Patent

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C23G 5/00 (2006.01) B08B 7/00 (2006.01) H01J 37/32 (2006.01)

Patent

CA 2476510

The invention relates to a method of cleaning the surface of a material (4) that is coated with an organic substance. The inventive method is characterised in that it comprises the following steps, consisting in: introducing the material (4) into a treatment chamber (2), having a pressure of between 10 mbar and 1 bar therein, which is supplied with a gas stream containing at least 90 volume percent of oxygen; and generating a plasma by passing an electric discharge between the surface of the material and a dielectric-covered electrode (5a, 5b, 5c, 5d, 5e, 5f, 5g) in order to break down the organic substance under the action of the free radicals O thus produced. The invention also relates to an installation (1) that is used to carry out said method.

L~invention concerne un procédé de nettoyage de la surface d~un matériau (4) enduit d~une substance organique, caractérisé en ce qu~il comprend les étapes consistant à : introduire ledit matériau (4) dans une enceinte de traitement (2) à l~intérieur de laquelle règne une pression comprise entre 10 mbar et 1 bar, et qui est alimentée par un flux gazeux comprenant au mois 90 0% en volume d~oxygène, générer un plasma en faisant passer une décharge électrique entre la surface dudit matériau et une électrode recouverte de diélectrique (5a, 5b, 5c, 5d, 5e, 5f, 5g), afin de décomposer ladite substance organique sous l~action des radicaux libres O ainsi produits, ainsi qu~une installation (1) pour la mise en oeuvre de ce procédé

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