Method for the preparation of trichlorosilane and silicon...

Details Method for the preparation of trichlorosilane and silicon... Method for the preparation of trichlorosilane and silicon...

C - Chemistry, Metallurgy

01

B

23/179

C01B 33/08 (2006.01)

Patent

CA 1085585

ABSTRACT OF THE DISCLOSURE: The invention is concerned with a method for the preparation of silicon tetrachloride and trichlorosilane by reaction of silicon or silicon-containing solid materials with hydrogen chloride in the presence of gaseous silicon tetra- chloride, at elevated temperature in a fluidized bed. The method of the invention is characterized in that the composition of the reaction products is controlled by operating with 0.2 to 10 parts by volume gaseous silicon tetrachloride per part by volume hydrogen chloride and with a specific reactor cross- sectional load of 250 to 2500 kg/m2.h, at a constant temperature between 250 and 500°C; the gaseous reaction products are thereafter drawn off from the reactor and separated.

282169

Affiliated with

Also associated with

Rating

Method for the preparation of trichlorosilane and silicon... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for the preparation of trichlorosilane and silicon..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for the preparation of trichlorosilane and silicon... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-48363