Method for the production of a nano-scale silicon dioxide

Details Method for the production of a nano-scale silicon dioxide Method for the production of a nano-scale silicon dioxide

C - Chemistry, Metallurgy

09

C

C09C 1/36 (2006.01) C09C 1/30 (2006.01)

Patent

CA 2694890

The object of the invention is a method for the production of a nano-scale silicon dioxide, said method comprising the following steps: a) provision of an aqueous suspension of a colloidal silicon dioxide with an average particle size of 1 to 500 nm; b) allowing said suspension to react with an organosilane or organosiloxane in an aprotic cyclic ether and silanization of the colloidal silicon dioxide; c) separation of the aqueous phase of the reaction mixture from the organic phase; d) allowing the organic phase to react again with an organosilane or organosiloxane in an aprotic cyclic ether and silanization of the colloidal silicon dioxide; e) separation of the aqueous phase of the reaction mixture from the organic phase.

L'invention concerne un procédé de production d'un dioxyde de silicium nanométrique, comprenant les étapes consistant : a) à prendre une suspension aqueuse d'un dioxyde de silicium colloidal dont les particules ont une taille moyenne de 1 à 500 nm; b) à la faire réagir avec un organosilane ou un organosiloxane dans un éther cyclique aprotique et à procéder à la silanisation du dioxyde de silicium colloidal; c) à séparer la phase aqueuse du mélange réactionnel de la phase organique; d) à faire une nouvelle fois réagir la phase organique avec un organosilane ou organosiloxane dans un éther cyclique aprotique et à silaniser le dioxyde de silicium colloidal; e) à séparer la phase aqueuse du mélange réactionnel de la phase organique.

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