Method for the production of a thin glassy coating on...

C - Chemistry – Metallurgy – 09 – D

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C09D 183/16 (2006.01) C08G 77/62 (2006.01) C08L 83/16 (2006.01)

Patent

CA 2616597

Disclosed is a method for producing a glassy, transparent coating on a substrate by coating the substrate with a solution containing a) a polysilazane of formula -(SiR'R"-NR'")n-, wherein R', R", R'" are identical or different and independently represent hydrogen or an optionally substituted alkyl radical, aryl radical, vinyl radical, or (trialkoxysilyl)alkyl radical, n being an integer or being calculated such that the polysilazane has a number- average molecular weight ranging from 150 to 150,000 g/mol, and b) a catalyst in an organic solvent, and then removing the solvent using evaporation such that a polysilazane layer having a thickness of 0.05 to 3.0 ~m remains on the substrate, and irradiating the polysilazane layer with VUV radiation having wavelength portions < 230 nm and UV radiation having wavelength portions ranging between 230 and 300 nm in an atmosphere containing steam in the presence of oxygen, active oxygen, and optional nitrogen.

Procédé de fabrication d'un revêtement transparent de type verre sur un substrat, qui consiste à appliquer sur le substrat une solution contenant (a) un polysilazane de formule -(SiR'R"-NR'")n- dans laquelle R', R'', R''' sont identiques ou différents et représentent indépendamment les uns des autres hydrogène ou un radical alkyle, aryle, vinyle ou (trialcoxysilyl)alkyle éventuellement substitué, n représentant un nombre entier et étant choisi de manière que le polysilazane possède un poids moléculaire moyen en nombre de 150 à 150 000 g/mol, et (b) un catalyseur dans un solvant organique, puis à éliminer le solvant par évaporation, une couche de polysilazane d'une épaisseur de 0,05 à 3,0 µm restant alors sur le substrat, et à exposer la couche de polysilazane à un rayonnement VUV ayant des longueurs d'onde inférieures à 230 nm et à un rayonnement UV ayant des longueurs d'onde dans la plage située entre 230 et 300 nm dans une atmosphère contenant de la vapeur d'eau en présence d'oxygène, d'oxygène actif et éventuellement d'azote.

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