Method for the treatment of substrates, substrate and...

H - Electricity – 01 – L

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H01L 31/18 (2006.01) H01L 21/311 (2006.01)

Patent

CA 2735740

In a method for the treatment of substrates (13) for solar cells composed of silicon, after multiple etching the substrates are cleaned (18) with DI water. Afterwards, the substrates (13) are dried and heated in drying stations (22, 25). The heated substrates (13) are subsequently oxidized in an oxidation station (30) by means of oxidation gas (34) with a proportion of ozone.

La présente invention concerne un procédé de traitement de substrat (13) destinés à des cellules solaires en silicium, les substrats subissant, après un décapage multiple, un nettoyage à l'eau DI (18). Les substrats (13) sont ensuite séchés et chauffés dans des stations de séchage (22, 25), puis les substrats (13) chauffés sont oxydés dans une station d'oxydation (30) avec un gaz oxydant (34) comprenant un constituant d'ozone.

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