Method for transferring patterns on silicone ladder type...

Details Method for transferring patterns on silicone ladder type... Method for transferring patterns on silicone ladder type...

G - Physics

03

F

149/25, 96/256

G03F 7/26 (2006.01) G03F 7/038 (2006.01) G03F 7/075 (2006.01) G03F 7/32 (2006.01) G03F 7/40 (2006.01)

Patent

CA 2010030

A method for transferring patterns on a silicone ladder type resin, which comprises: applying onto a substrate a silicone ladder type resin to be represented by the following general formula (I) Image (I) (where: R1 denotes a phenyl group or a lower alkyl group, and two R1's may be the same or different kinds; R2 denotes hydrogen atom or a lower alkyl group, and four R2's may be the same or different kinds; and n represents an integer of from 5 to 1,000); drying the thus applied resin layer; thereafter applying onto the resin layer a cresol novolac type positive photo-resist; forming a predetermined pattern in the photo-resist layer; subjecting the photo-resist layer to pretreatment; and finally etching the silicone ladder type resin. An etching liquid for etching a silicone ladder type resin, which comprises an aromatic type solvent.

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