C - Chemistry – Metallurgy – 23 – F
Patent
C - Chemistry, Metallurgy
23
F
C23F 1/46 (2006.01)
Patent
CA 2081578
In order to ensure an easy operation a decreased cost in maintenance and installation and a safely and effective use of chlorine gas generated in a closed system, a new method for treating an etchant is offered. The method comprises the following steps of; (1) treating an etchant including copper (1) chloride or ferric chloride containing copper by means of an electrolysis using a diaphragm to withdraw copper electrolytically deposited in a cathode cell, (2) supplying chlorine gas generated in an anode cell into another etchant used in an etching process, thereby enabling the etchant to be regenerated.
Mikami Yasuie
Oisaki Masaaki
Shibasaki Masao
Mikami Yasuie
Nittetsu Mining Co. Ltd.
Oisaki Masaaki
Ridout & Maybee Llp
Shibasaki Masao
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