Method for utilizing a residue containing elemental silicon

Details Method for utilizing a residue containing elemental silicon Method for utilizing a residue containing elemental silicon

C - Chemistry, Metallurgy

01

B

23/179

C01B 33/08 (2006.01) C01B 33/107 (2006.01) C07F 7/16 (2006.01) C07F 7/20 (2006.01)

Patent

CA 1119380

ABSTRACT OF THE DISCLOSURE An improved method is provided for reactivating a residue con- taining elemental silicon in the form of particles having a maximum diameter of 50 microns. These particles have been recovered from the reaction of hydrocarbon halides, or hydrogen halides, or mixtures thereof, with a solid porous contact mass containing silica, to form silicon halide. The improved method includes heating the residue containing the elemental silicon for from 20 to 80 hours at a temperature of from 100 to 350°C. in the presence of atmospheric air and/or an inert gas. In this way, the spent residue can be reactivated and reused in the preparation of silicon halides without contaminating the environment and without expending large amounts of energy.

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