G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/027 (2006.01) G03F 7/004 (2006.01)
Patent
CA 2159153
A method of adjusting thixotropy is provided for a composition comprising (a) between about 15 and about 35 wt. percent of a polymerizable acrylic monomer, (b) between about 3 and about 15 wt. percent of a photosensitive, free radical-generating initiator chemical system which in the presence of actinic radiation initiates polymerization of acrylic moieties, (c) between about 5 and about 35 wt. percent epoxy-acrylate oligomer, (d) between about 20 and about 80 wt. percent of an epoxy resin composition having an epoxy equivalent between 200 and 700, which epoxy composition is curable to harden said photoimageable composition subsequent to exposure to actinic radiation, (e) between about 0.1 and about 10 wt. percent of an acidic curative for said epoxy resin, and (f) up to about 15 wt. percent, preferably at least about 2 wt. percent, of a hydroxyl group-reactive cross-linking agent, the percentages being based on the total levels of (a)-(f), and which components (a)-(f) are selected so that the components form a homogeneous solution in an organic solvent which dries to a homogeneous composition which is soluble in alkaline aqueous solution, whereby said photoimageable composition is developable in aqueous or alkaline aqueous solution, and which composition further contains fumed silica at a level of between about 1 and about 5 wt% based upon the total of components (a)-(f), the method comprising adding to the composition between about 50 and about 120 wt% based on total weight of (a)-(f) of a solvent which is a ester formed from acetic acid and a C6-C8 alcohol or mixtures of C6-C8 alcohols plus any additional miscible organic solvent so as to provide a total solvent level of between about 60 and about 120 wt% relative to (a)-(f).
Lien Shawn
Tara Vinai Ming
Gowling Lafleur Henderson Llp
Morton International Inc.
LandOfFree
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