G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/20 (2006.01) G05D 5/00 (2006.01) G05D 23/19 (2006.01) H01L 21/027 (2006.01)
Patent
CA 2077572
A temperature distribution of an object, such as an optical element, onto which radiation energy is irradiated, is measured. The change of the shape of the object is controlled by varying the temperature of a part of the object on the basis of the measured temperature distribution to stabilize the shape of the object. Also, the shape of the object being irradiated is stabilized by causing the same temperature distribution in the object when in the thermally stable condition to be generated in the object while it is being irradiated. If the shapes of masks used to manufacture semiconductor devices are stabilized by using the above methods, highly integrated semiconductor devices can be manufactured.
La distribution de température d'un objet irradié, tel qu'un élément optique, est mesurée. On contrôle les variations de forme de cet objet pour en stabiliser la forme en faisant varier la température d'une partie de cet objet d'après la distribution de température mesurée. On stabilise cette forme en créant dans l'objet la distribution de température qui serait créée par une irradiation. Si les formes des masques utilisés dans la fabrication des dispositifs à semi-conducteur sont stabilisées en utilisant les méthodes décrites ci-dessus, on peut fabriquer des dispositifs à semi-conducteur à grande densité d'intégration.
Fukuda Yasuaki
Hayashida Masami
Niibe Masahito
Canon Kabushiki Kaisha
Ridout & Maybee Llp
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