Method of and device for measuring the refractive index of...

Details Method of and device for measuring the refractive index of... Method of and device for measuring the refractive index of...

G - Physics

01

N

G01N 21/41 (2006.01) G01N 21/43 (2006.01) G01N 21/45 (2006.01)

Patent

CA 2173564

A method and device for calculating refractive index for a wafer of vitreous material. A light beam is transmitted to a wafer at different angles of incidence, to produce fluctuations in the transmittance of the beam by the wafer. The transmittance of the wafer is measured as the angle of incidence varies and the angular positions of transmittance maxima and minima are determined with respect to a maximum or minimum corresponding to a normal incidence. The refractive index is obtained from these positions and from the number of maxima and minima in various angles of incidence.

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