Method of and photomask for manufacturing optical memory...

Details Method of and photomask for manufacturing optical memory... Method of and photomask for manufacturing optical memory...

G - Physics

11

B

96/256, 95/94.5

G11B 7/26 (2006.01) H01L 21/308 (2006.01)

Patent

CA 1334138

A method is disclosed for manufacturing an optical memory element, together with a photomask for use in such method. The manufacturing method includes subjecting a positive type photoresist coated on a glass substrate to exposure using a photomask capable of permitting irradiation of light onto a portion of the photoresist other than a remaining portion for forming pits in the glass substrate. The portion of the photoresist is solubilized against developing solution and the photoresist is developed using the developing solution to remove the portion of the photoresist. The glass substrate is then etched so as to form the pits directly as convex portions on the surface of the glass substrate.

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