Method of applying a photosensitive resin to a substrate for...

G - Physics – 03 – F

Patent

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Details

G03F 7/16 (2006.01) B29C 35/10 (2006.01) B29C 39/18 (2006.01) B29C 39/20 (2006.01) D06N 3/00 (2006.01) D21F 7/08 (2006.01) D21F 11/00 (2006.01) B29C 35/08 (2006.01)

Patent

CA 2212144

The invention comprises a method for applying a curable resin, such as a photosensitive resin, to a substrate such as a papermaker's dewatering felt. The method comprises the steps of providing a substrate; providing a curable liquid resin; providing a second material different from the curable liquid resin; applying the second material to the substrate to occupy at least some of the voids in the substrate intermediate the first and second surfaces of the substrate; applying the curable resin to the substrate; curing at least some of the resin to provide a resin layer on the substrate; and removing at least some of the second material from the substrate, wherein at least some of the second material is removed from the substrate after applying the curable resin to the substrate.

La présente invention consiste en un procédé d'application d'une résine durcissable, telle qu'une résine photosensible, sur un substrat comme un feutre d'essorage de papetier. Le procédé comprend les étapes suivantes : fournir un substrat, une résine liquide durcissable et une seconde substance différente de la résine liquide durcissable; appliquer la seconde substance sur le substrat pour remplir au moins quelques vides dans le substrat intermédiaire aux première et seconde surfaces de celui-ci; appliquer la résine durcissable au substrat; faire durcir une partie de la résine afin de fournir une couche de résine sur le substrat; et enlever une partie de la seconde substance du substrat, où au moins une partie de la seconde substance est enlevée du substrat après avoir appliquer la résine durcissable sur le substrat.

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